1# Library to Find Best eBook for Read
Author : Fred Roozeboom
Release : 1999
Genre : Technology & Engineering
Kind : eBook
Book Rating : 327/5 ( reviews)
Book Synopsis Advances in Rapid Thermal Processing by : Fred Roozeboom
Download or read book Advances in Rapid Thermal Processing written by Fred Roozeboom. This book was released on 1999. Available in PDF, EPUB and Kindle. Book excerpt:
Author : F. Roozeboom
Release : 2013-03-09
Genre : Science
Kind : eBook
Book Rating : 116/5 ( reviews)
Book Synopsis Advances in Rapid Thermal and Integrated Processing by : F. Roozeboom
Download or read book Advances in Rapid Thermal and Integrated Processing written by F. Roozeboom. This book was released on 2013-03-09. Available in PDF, EPUB and Kindle. Book excerpt: Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Author : J. C. Gelpey
Release : 1996-10-14
Genre : Technology & Engineering
Kind : eBook
Book Rating : /5 ( reviews)
Book Synopsis Rapid Thermal and Integrated Processing V: Volume 429 by : J. C. Gelpey
Download or read book Rapid Thermal and Integrated Processing V: Volume 429 written by J. C. Gelpey. This book was released on 1996-10-14. Available in PDF, EPUB and Kindle. Book excerpt: This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
Author : F. Roozeboom
Release : 2014-01-15
Genre :
Kind : eBook
Book Rating : 129/5 ( reviews)
Book Synopsis Advances in Rapid Thermal and Integrated Processing by : F. Roozeboom
Download or read book Advances in Rapid Thermal and Integrated Processing written by F. Roozeboom. This book was released on 2014-01-15. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Richard B. Fair
Release : 2012-12-02
Genre : Technology & Engineering
Kind : eBook
Book Rating : 809/5 ( reviews)
Book Synopsis Rapid Thermal Processing by : Richard B. Fair
Download or read book Rapid Thermal Processing written by Richard B. Fair. This book was released on 2012-12-02. Available in PDF, EPUB and Kindle. Book excerpt: This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
