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Strain-Engineered MOSFETs

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Release : 2018-10-03
Genre : Technology & Engineering
Kind : eBook
Book Rating : 475/5 ( reviews)

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Book Synopsis Strain-Engineered MOSFETs by : C.K. Maiti

Download or read book Strain-Engineered MOSFETs written by C.K. Maiti. This book was released on 2018-10-03. Available in PDF, EPUB and Kindle. Book excerpt: Currently strain engineering is the main technique used to enhance the performance of advanced silicon-based metal-oxide-semiconductor field-effect transistors (MOSFETs). Written from an engineering application standpoint, Strain-Engineered MOSFETs introduces promising strain techniques to fabricate strain-engineered MOSFETs and to methods to assess the applications of these techniques. The book provides the background and physical insight needed to understand new and future developments in the modeling and design of n- and p-MOSFETs at nanoscale. This book focuses on recent developments in strain-engineered MOSFETS implemented in high-mobility substrates such as, Ge, SiGe, strained-Si, ultrathin germanium-on-insulator platforms, combined with high-k insulators and metal-gate. It covers the materials aspects, principles, and design of advanced devices, fabrication, and applications. It also presents a full technology computer aided design (TCAD) methodology for strain-engineering in Si-CMOS technology involving data flow from process simulation to process variability simulation via device simulation and generation of SPICE process compact models for manufacturing for yield optimization. Microelectronics fabrication is facing serious challenges due to the introduction of new materials in manufacturing and fundamental limitations of nanoscale devices that result in increasing unpredictability in the characteristics of the devices. The down scaling of CMOS technologies has brought about the increased variability of key parameters affecting the performance of integrated circuits. This book provides a single text that combines coverage of the strain-engineered MOSFETS and their modeling using TCAD, making it a tool for process technology development and the design of strain-engineered MOSFETs.

Hot-carrier reliability of strain-engineered MOSFETs

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Author :
Release : 2003
Genre :
Kind : eBook
Book Rating : /5 ( reviews)

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Book Synopsis Hot-carrier reliability of strain-engineered MOSFETs by : David Quest Kelly

Download or read book Hot-carrier reliability of strain-engineered MOSFETs written by David Quest Kelly. This book was released on 2003. Available in PDF, EPUB and Kindle. Book excerpt:

Performance enhancement in column IV mobility, bandgap, and strain engineered MOSFETs

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Author :
Release : 2003
Genre : Metal oxide semiconductor field-effect transistors
Kind : eBook
Book Rating : /5 ( reviews)

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Book Synopsis Performance enhancement in column IV mobility, bandgap, and strain engineered MOSFETs by : David Masara Onsongo

Download or read book Performance enhancement in column IV mobility, bandgap, and strain engineered MOSFETs written by David Masara Onsongo. This book was released on 2003. Available in PDF, EPUB and Kindle. Book excerpt:

Strain-Induced Effects in Advanced MOSFETs

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Author :
Release : 2011-01-06
Genre : Technology & Engineering
Kind : eBook
Book Rating : 827/5 ( reviews)

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Book Synopsis Strain-Induced Effects in Advanced MOSFETs by : Viktor Sverdlov

Download or read book Strain-Induced Effects in Advanced MOSFETs written by Viktor Sverdlov. This book was released on 2011-01-06. Available in PDF, EPUB and Kindle. Book excerpt: Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given.

Stress and Strain Engineering at Nanoscale in Semiconductor Devices

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Release : 2021-06-29
Genre : Science
Kind : eBook
Book Rating : 935/5 ( reviews)

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Book Synopsis Stress and Strain Engineering at Nanoscale in Semiconductor Devices by : Chinmay K. Maiti

Download or read book Stress and Strain Engineering at Nanoscale in Semiconductor Devices written by Chinmay K. Maiti. This book was released on 2021-06-29. Available in PDF, EPUB and Kindle. Book excerpt: Anticipating a limit to the continuous miniaturization (More-Moore), intense research efforts are being made to co-integrate various functionalities (More-than-Moore) in a single chip. Currently, strain engineering is the main technique used to enhance the performance of advanced semiconductor devices. Written from an engineering applications standpoint, this book encompasses broad areas of semiconductor devices involving the design, simulation, and analysis of Si, heterostructure silicongermanium (SiGe), and III-N compound semiconductor devices. The book provides the background and physical insight needed to understand the new and future developments in the technology CAD (TCAD) design at the nanoscale. Features Covers stressstrain engineering in semiconductor devices, such as FinFETs and III-V Nitride-based devices Includes comprehensive mobility model for strained substrates in global and local strain techniques and their implementation in device simulations Explains the development of strain/stress relationships and their effects on the band structures of strained substrates Uses design of experiments to find the optimum process conditions Illustrates the use of TCAD for modeling strain-engineered FinFETs for DC and AC performance predictions This book is for graduate students and researchers studying solid-state devices and materials, microelectronics, systems and controls, power electronics, nanomaterials, and electronic materials and devices.

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