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Author : N. M. Ravindra
Release : 1999
Genre :
Kind : eBook
Book Rating : /5 ( reviews)
Book Synopsis Manufacturing Issues in Rapid Thermal Processing by : N. M. Ravindra
Download or read book Manufacturing Issues in Rapid Thermal Processing written by N. M. Ravindra. This book was released on 1999. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Minerals, Metals and Materials Society
Release : 1999
Genre :
Kind : eBook
Book Rating : /5 ( reviews)
Book Synopsis Special Issue on Manufacturing Issues in Rapid Thermal Processing by : Minerals, Metals and Materials Society
Download or read book Special Issue on Manufacturing Issues in Rapid Thermal Processing written by Minerals, Metals and Materials Society. This book was released on 1999. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Richard B. Fair
Release : 2012-12-02
Genre : Technology & Engineering
Kind : eBook
Book Rating : 809/5 ( reviews)
Book Synopsis Rapid Thermal Processing by : Richard B. Fair
Download or read book Rapid Thermal Processing written by Richard B. Fair. This book was released on 2012-12-02. Available in PDF, EPUB and Kindle. Book excerpt: This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Author : A. Slaoui
Release : 1999-03-17
Genre : Science
Kind : eBook
Book Rating : 128/5 ( reviews)
Book Synopsis Rapid Thermal Processing by : A. Slaoui
Download or read book Rapid Thermal Processing written by A. Slaoui. This book was released on 1999-03-17. Available in PDF, EPUB and Kindle. Book excerpt: Rapid Thermal Processing (RTP) is a well established single-wafer technology in USLI semiconductor manufacturing and electrical engineering, as well as in materials science. The biggest advantage of RTP is that it eliminates the long-ramp-up and ramp-down times associated with furnaces, enabling a significant reduction in the thermal budget. Today, RTP is in production use for source/drain implant annealing, contact alloying, formation of refractory nitrides and silicides and thin gate dielectric (oxide) formation. The aim of Symposium I was to provide an overview of the latest information on research and development in the different topics cited above. The potential applications of RTP in new areas like large area devices such as flat planel displays and solar cells has to be investigated. About 30 papers were presented in this symposium. The contributions of most interest involved modelling and control, junctions formation and thermal oxidation, deposition and recrystallisation and silicide formations. However, the range of topics and the intent to focus on underlying, fundamental issues like dopant diffusion in silicon from solid sources, strain relaxation and photonic effects, nucleation as well as applications to magnetic films and solar cells devices.
Author : F. Roozeboom
Release : 2013-03-09
Genre : Science
Kind : eBook
Book Rating : 116/5 ( reviews)
Book Synopsis Advances in Rapid Thermal and Integrated Processing by : F. Roozeboom
Download or read book Advances in Rapid Thermal and Integrated Processing written by F. Roozeboom. This book was released on 2013-03-09. Available in PDF, EPUB and Kindle. Book excerpt: Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
