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New Methodologies for Interconnect Reliability Assessments of Integrated Circuits

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Release : 2000
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Book Synopsis New Methodologies for Interconnect Reliability Assessments of Integrated Circuits by :

Download or read book New Methodologies for Interconnect Reliability Assessments of Integrated Circuits written by . This book was released on 2000. Available in PDF, EPUB and Kindle. Book excerpt: By Stefan P. Hau-Riege.

New Methodologies for Interconnect Reliability Assessments of Integrated Circuits

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Author :
Release : 2000
Genre :
Kind : eBook
Book Rating : /5 ( reviews)

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Book Synopsis New Methodologies for Interconnect Reliability Assessments of Integrated Circuits by : Stefan Peter Hau-Riege

Download or read book New Methodologies for Interconnect Reliability Assessments of Integrated Circuits written by Stefan Peter Hau-Riege. This book was released on 2000. Available in PDF, EPUB and Kindle. Book excerpt:

Design Tool and Methodologies for Interconnect Reliability Analysis in Integrated Circuits

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Release : 2004
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Book Synopsis Design Tool and Methodologies for Interconnect Reliability Analysis in Integrated Circuits by : Syed Mohiul Alam

Download or read book Design Tool and Methodologies for Interconnect Reliability Analysis in Integrated Circuits written by Syed Mohiul Alam. This book was released on 2004. Available in PDF, EPUB and Kindle. Book excerpt: Total on-chip interconnect length has been increasing exponentially with technology scaling. Consequently, interconnect-driven design is an emerging trend in state-of-the- art integrated circuits. Cu-based interconnect technology is expected to meet some of the challenges of technology scaling. However, Cu interconnects still pose a reliability concern due to electromigration-induced failure over time. The major contribution of this thesis is a new reliability CAD tool, SysRel, for thermal-aware reliability analysis with either Al or Cu metallization technology in conventional and three-dimensional integrated circuits. An interconnect tree is the fundamental reliability unit for circuit-level reliability assessments for metallization schemes with fully-blocking boundaries at the vias. When vias do not block electromigration as indicated in some Cu experimental studies, multiple trees linked by a non-blocking via are merged to create a single fundamental reliability unit. SysRel utilizes a tree-based hierarchical analysis that sufficiently captures the differences between electromigration behavior in Al and Cu metallizations. The hierarchical flow first identifies electromigration-critical nets or "mortal" trees, applies a default model to estimate the lifetimes of individual trees, and then produces a set of full-chip reliability metrics based on stochastic analysis using the desired lifetime of the circuit. We have exercised SysRel to compare layout-specific reliability with Cu and Al metallizations in various circuits and circuit elements. Significantly improved test-level reliability in Cu is required to achieve equivalent circuit-level reliability. The required improvement will increase as low-k dielectric materials are introduced and liner thicknesses are reduced in future.

Algorithms and methodologies for interconnect reliability analysis of integrated circuits

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Release : 2017
Genre :
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Book Synopsis Algorithms and methodologies for interconnect reliability analysis of integrated circuits by : Palkesh Jain

Download or read book Algorithms and methodologies for interconnect reliability analysis of integrated circuits written by Palkesh Jain. This book was released on 2017. Available in PDF, EPUB and Kindle. Book excerpt: The phenomenal progress of computing devices has been largely made possible by the sustained efforts of semiconductor industry in innovating techniques for extremely large-scale integration. Indeed, gigantically integrated circuits today contain multi-billion interconnects which enable the transistors to talk to each other -all in a space of few mm2. Such aggressively downscaled components (transistors and interconnects) silently suffer from increasing electric fields and impurities/defects during manufacturing. Compounded by the Gigahertz switching, the challenges of reliability and design integrity remains very much alive for chip designers, with Electro migration (EM) being the foremost interconnect reliability challenge. Traditionally, EM containment revolves around EM guidelines, generated at single-component level, whose non-compliance means that the component fails. Failure usually refers to deformation due to EM -manifested in form of resistance increase, which is unacceptable from circuit performance point of view. Subsequent aspects deal with correct-by-construct design of the chip followed by the signoff-verification of EM reliability. Interestingly, chip designs today have reached a dilemma point of reduced margin between the actual and reliably allowed current densities, versus, comparatively scarce system-failures. Consequently, this research is focused on improved algorithms and methodologies for interconnect reliability analysis enabling accurate and design-specific interpretation of EM events. In the first part, we present a new methodology for logic-IP (cell) internal EM verification: an inadequately attended area in the literature. Our SPICE-correlated model helps in evaluating the cell lifetime under any arbitrary reliability speciation, without generating additional data - unlike the traditional approaches. The model is apt for today's fab less eco-system, where there is a) increasing reuse of standard cells optimized for one market condition to another (e.g., wireless to automotive), as well as b) increasing 3rd party content on the chip requiring a rigorous sign-off. We present results from a 28nm production setup, demonstrating significant violations relaxation and flexibility to allow runtime level reliability retargeting. Subsequently, we focus on an important aspect of connecting the individual component-level failures to that of the system failure. We note that existing EM methodologies are based on serial reliability assumption, which deems the entire system to fail as soon as the first component in the system fails. With a highly redundant circuit topology, that of a clock grid, in perspective, we present algorithms for EM assessment, which allow us to incorporate and quantify the benefit from system redundancies. With the skew metric of clock-grid as a failure criterion, we demonstrate that unless such incorporations are done, chip lifetimes are underestimated by over 2x. This component-to-system reliability bridge is further extended through an extreme order statistics based approach, wherein, we demonstrate that system failures can be approximated by an asymptotic kth-component failure model, otherwise requiring costly Monte Carlo simulations. Using such approach, we can efficiently predict a system-criterion based time to failure within existing EDA frameworks. The last part of the research is related to incorporating the impact of global/local process variation on current densities as well as fundamental physical factors on EM. Through Hermite polynomial chaos based approach, we arrive at novel variations-aware current density models, which demonstrate significant margins (> 30 %) in EM lifetime when compared with the traditional worst case approach. The above research problems have been motivated by the decade-long work experience of the author dealing with reliability issues in industrial SoCs, first at Texas Instruments and later at Qualcomm.

Reliability of Nanoscale Circuits and Systems

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Release : 2010-10-20
Genre : Technology & Engineering
Kind : eBook
Book Rating : 174/5 ( reviews)

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Book Synopsis Reliability of Nanoscale Circuits and Systems by : Miloš Stanisavljević

Download or read book Reliability of Nanoscale Circuits and Systems written by Miloš Stanisavljević. This book was released on 2010-10-20. Available in PDF, EPUB and Kindle. Book excerpt: This book is intended to give a general overview of reliability, faults, fault models, nanotechnology, nanodevices, fault-tolerant architectures and reliability evaluation techniques. Additionally, the book provides an in depth state-of-the-art research results and methods for fault tolerance as well as the methodology for designing fault-tolerant systems out of highly unreliable components.

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