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Ion Implantation and Beam Processing

2014-06-28 Technology & Engineering
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Release : 2014-06-28
Genre : Technology & Engineering
Kind : eBook
Book Rating : 648/5 ( reviews)

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Book Synopsis Ion Implantation and Beam Processing by : J. S. Williams

Download or read book Ion Implantation and Beam Processing written by J. S. Williams. This book was released on 2014-06-28. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.

Ion Implantation and Synthesis of Materials

2007-05-16 Science
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Release : 2007-05-16
Genre : Science
Kind : eBook
Book Rating : 982/5 ( reviews)

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Book Synopsis Ion Implantation and Synthesis of Materials by : Michael Nastasi

Download or read book Ion Implantation and Synthesis of Materials written by Michael Nastasi. This book was released on 2007-05-16. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Ion Implantation and Ion Beam Processing of Materials

1984 Science
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Release : 1984
Genre : Science
Kind : eBook
Book Rating : /5 ( reviews)

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Book Synopsis Ion Implantation and Ion Beam Processing of Materials by : G. K. Hubler

Download or read book Ion Implantation and Ion Beam Processing of Materials written by G. K. Hubler. This book was released on 1984. Available in PDF, EPUB and Kindle. Book excerpt:

Ion Implantation: Basics to Device Fabrication

2013-11-27 Technology & Engineering
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Release : 2013-11-27
Genre : Technology & Engineering
Kind : eBook
Book Rating : 595/5 ( reviews)

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Book Synopsis Ion Implantation: Basics to Device Fabrication by : Emanuele Rimini

Download or read book Ion Implantation: Basics to Device Fabrication written by Emanuele Rimini. This book was released on 2013-11-27. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.

Ion Implantation and Ion Beam Processing of Materials

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Kind : eBook
Book Rating : 695/5 ( reviews)

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Book Synopsis Ion Implantation and Ion Beam Processing of Materials by :

Download or read book Ion Implantation and Ion Beam Processing of Materials written by . This book was released on . Available in PDF, EPUB and Kindle. Book excerpt:

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