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In Situ Monitoring and Characterization of Superhard Thin-Film Growth Under Non-Equilibrium Conditions

2000
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Release : 2000
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Book Synopsis In Situ Monitoring and Characterization of Superhard Thin-Film Growth Under Non-Equilibrium Conditions by :

Download or read book In Situ Monitoring and Characterization of Superhard Thin-Film Growth Under Non-Equilibrium Conditions written by . This book was released on 2000. Available in PDF, EPUB and Kindle. Book excerpt: We have developed new approaches to synthesize superhard/ultrastrong thin films and coatings by chemical vapor deposition (CVD) of unimolecular precursors, and to monitor and characterize the film-growth process in situ and in real time. To this end, we have designed and constructed an ultrahigh vacuum CVD chamber fitted with energy-dispersive x-ray reflectivity (XRR) and multiple- beam optical stress sensor (MOSS) for in situ monitoring of surface morphology and stress evolution of the films under growth. Both of these techniques were applied to the CVD growth of boron and GaN films. We have synthesized novel precursors of C3N3P, Si4CN4, LiBC4N4, BC3N3, BeC2N2, MgC2N2 for CVD growth of films with properties of superhardness. We have also deposited thin films by CVD with the composition of Zr-B-Si-N via reactions of Zr(BH4)4 with SiH4, and Zr(BH4)4 with N(SiH3)4. The elastic constants cli and c44 of these films measured by Brillouin scattering in collaboration with Prof. Sooryakumar of Ohio State University produced results suggesting that films and coatings based on the Zr-B-Si-N system exhibit promising superhard properties.

In Situ Real-Time Characterization of Thin Films

2001 Science
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Release : 2001
Genre : Science
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Book Rating : 416/5 ( reviews)

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Book Synopsis In Situ Real-Time Characterization of Thin Films by : Orlando Auciello

Download or read book In Situ Real-Time Characterization of Thin Films written by Orlando Auciello. This book was released on 2001. Available in PDF, EPUB and Kindle. Book excerpt: An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application

In Situ Characterization of Thin Film Growth

2011-10-05 Technology & Engineering
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Release : 2011-10-05
Genre : Technology & Engineering
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Book Rating : 955/5 ( reviews)

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Book Synopsis In Situ Characterization of Thin Film Growth by : Gertjan Koster

Download or read book In Situ Characterization of Thin Film Growth written by Gertjan Koster. This book was released on 2011-10-05. Available in PDF, EPUB and Kindle. Book excerpt: Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques

Nonequilibrium Thin-Film Growth

2010-06
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Release : 2010-06
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Book Rating : 419/5 ( reviews)

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Book Synopsis Nonequilibrium Thin-Film Growth by : Nuno Araujo

Download or read book Nonequilibrium Thin-Film Growth written by Nuno Araujo. This book was released on 2010-06. Available in PDF, EPUB and Kindle. Book excerpt: When films growth under nonequilibrium conditions, phenomena not predicted from microscopic interactions emerge at the macroscopic level. Statistical Physics concepts and methods are then the meaningful methodology to study the problem. This book discusses the influence of the particle/particle and particle/substrate interaction rules on the morphology of the obtained film. Based on the work of the author s phD thesis, interesting structures are discussed, emerging from simple interacting rules as the ones from random sequential adsorption process either in the presence of patterned substrates or during competitive adsorption of particles with different sizes. For the growth regime where diffusion of particles on the substrate cannot be neglected, the influence of the flux of impinging particles on the nucleation and growth of islands is also covered.

Why in Situ, Real-time Characterization of Thin Film Growth Processes?

1995
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Release : 1995
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Book Synopsis Why in Situ, Real-time Characterization of Thin Film Growth Processes? by :

Download or read book Why in Situ, Real-time Characterization of Thin Film Growth Processes? written by . This book was released on 1995. Available in PDF, EPUB and Kindle. Book excerpt:

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