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Author : Li Xu
Release : 2008
Genre :
Kind : eBook
Book Rating : /5 ( reviews)
Book Synopsis Fabrication and Characterization of Metal-molecule-silicon Devices by : Li Xu
Download or read book Fabrication and Characterization of Metal-molecule-silicon Devices written by Li Xu. This book was released on 2008. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Cherng-chi Yin
Release : 1989
Genre : Amorphous semiconductors
Kind : eBook
Book Rating : /5 ( reviews)
Book Synopsis Fabrication and Characterization of Amorphous Silicon Devices Made by Plasma-enhanced Chemical-vapor Deposition by : Cherng-chi Yin
Download or read book Fabrication and Characterization of Amorphous Silicon Devices Made by Plasma-enhanced Chemical-vapor Deposition written by Cherng-chi Yin. This book was released on 1989. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jo Nijs
Release : 2021-05-30
Genre : Science
Kind : eBook
Book Rating : 790/5 ( reviews)
Book Synopsis Advanced Silicon & Semiconducting Silicon-Alloy Based Materials & Devices by : Jo Nijs
Download or read book Advanced Silicon & Semiconducting Silicon-Alloy Based Materials & Devices written by Jo Nijs. This book was released on 2021-05-30. Available in PDF, EPUB and Kindle. Book excerpt: One of the first books to cover advanced silicon-based technologies, Advanced Silicon and Semiconducting Silicon Alloy-Based Materials and Devices presents important directions for research into silicon, its alloy-based semiconducting devices, and its development in commercial applications. The first section deals with single/mono crystalline silicon, focusing on the effects of heavy doping; the structure and electronic properties of defects and their impact on devices; the MBE of silicon, silicon alloys, and metals; CVD techniques for silicon and silicon germanium; the material properties of silicon germanium strained layers; silicon germanium heterojunction bipolar applications; FETs, IR detectors, and resonant tunneling devices in silicon, silicon germanium, and d-doped silicon; and the fascinating properties of crystalline silicon carbide and its applications. The second section explores polycrystalline silicon. It examines large grain polysilicon substrates for solar cells; the properties, analysis, and modeling of polysilicon TFTs; the technology of polysilicon TFTs in LCD displays; and the use of polycrystalline silicon and its alloys in VLSI applications. With contributors from leading academic and industrial research centers, this book provides wide coverage of fabrication techniques, material properties, and device applications.
Author : Yale Strausser
Release : 2013-10-22
Genre : Technology & Engineering
Kind : eBook
Book Rating : 420/5 ( reviews)
Book Synopsis Characterization in Silicon Processing by : Yale Strausser
Download or read book Characterization in Silicon Processing written by Yale Strausser. This book was released on 2013-10-22. Available in PDF, EPUB and Kindle. Book excerpt: This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Author : E. Kasper
Release : 2018-05-04
Genre : Technology & Engineering
Kind : eBook
Book Rating : 525/5 ( reviews)
Book Synopsis Silicon Molecular Beam Epitaxy by : E. Kasper
Download or read book Silicon Molecular Beam Epitaxy written by E. Kasper. This book was released on 2018-05-04. Available in PDF, EPUB and Kindle. Book excerpt: This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
