Author : Alexander Nichau
Release : 2014-04-03
Genre :
Kind : eBook
Book Rating : 981/5 ( reviews)
Book Synopsis Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications by : Alexander Nichau
Download or read book Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications written by Alexander Nichau. This book was released on 2014-04-03. Available in PDF, EPUB and Kindle. Book excerpt: